PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing

Stephen M. Rossnagel (Series edited by), Ronald Powell (Series edited by), Abraham Ulman (Series edited by)

9780125330268

Hardback, published 29 October 1998

419 pages
22.9 x 15.2 x 2.7 cm, 0.81 kg

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.

This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

Useful Conversion Factors and Constants
Introduction
Physics of Sputtering
Plasma Systems
The Planar Magnetron
Sputtering Tools
Directional Deposition
Planarized PVD: Use of Elevated Temperature and/or High Pressure
Ionized Magnetron Sputter Deposition
PVD Materials and Processes
Process Modeling for Magnetron Deposition
Sputtering Targets

Subject Areas: Materials science [TGM], Electrochemistry & magnetochemistry [PNRH], Applied physics [PHV], Condensed matter physics [liquid state & solid state physics PHFC]