Nontraditional Approaches to Patterning

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Shu Yang (Edited by), Younan Xia (Edited by), Jie Liu (Edited by), Charles D. E. Lakeman (Edited by)

9781558997462, Materials Research Society

Hardback, published 1 January 2003

216 pages
23 x 15.2 x 1.2 cm, 0.31 kg

More and more researchers are recognizing the importance of patterning materials into well-defined structures and their immediate impacts to many areas that include physics, chemistry, biology, and engineering. Compared to traditional lithographic techniques, nontraditional approaches (e.g., self-assembly, soft lithography, embossing, dip-pen lithography, scanning probe lithography and lase- induced patterning) provide avenues to explore new scientific phenomena, as well as to realize new devices in microelectronics, photonics, sensors, MEMS, and lab-on-chip systems with lower cost, higher throughput, and larger quantities. The ability to directly pattern materials in three dimensions (e.g., self-assembly, two-photon absorption and interference lithography) with tailored shape, size, and chemistry provides unparalleled control over material structures and properties. In this book, a wide range of researchers exchange views, learn about the latest advancement in materials science and engineering and develop new concepts and research directions in material patterning. Topics include: synthesis and assembly of nanostructures; soft lithography; SPM-based nanolithography; self-assembly; 3D patterning and other methods.

Subject Areas: Materials science [TGM]