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Handbook of Silicon Based MEMS Materials and Technologies
A comprehensive, well-proven reference work on state-of-the-art MEMS materials, technologies and manufacturing, emphasizing current and future applications
Markku Tilli (Edited by), Mervi Paulasto-Kröckel (Edited by), Teruaki Motooka (Edited by), Veikko Lindroos (Edited by)
9780323299657, Elsevier Science
Hardback, published 30 October 2015
826 pages
27.6 x 21.5 x 4.1 cm, 2.42 kg
The Handbook of Silicon Based MEMS Materials and Technologies, Second Edition, is a comprehensive guide to MEMS materials, technologies, and manufacturing that examines the state-of-the-art with a particular emphasis on silicon as the most important starting material used in MEMS. The book explains the fundamentals, properties (mechanical, electrostatic, optical, etc.), materials selection, preparation, manufacturing, processing, system integration, measurement, and materials characterization techniques, sensors, and multi-scale modeling methods of MEMS structures, silicon crystals, and wafers, also covering micromachining technologies in MEMS and encapsulation of MEMS components. Furthermore, it provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques, shows how to protect devices from the environment, and provides tactics to decrease package size for a dramatic reduction in costs.
Impact of Silicon MEMS Section I: Silicon as MEMS Material 1. Properties of Silicon 2. Czochralski Growth of SiliconCrystals 3. Properties of Silicon Crystals 4. Silicon Wafers: Preparation and Properties 5. Epi Wafers: Preparation and Properties 6. Thin Films on Silicon 6.1 Thin films on Silicon: Silicon dioxide 6.2 Thin films on Silicon: Silicon nitride 6.3 Thin Films on Silicon: Poly-Si and SiGe 6.4 Thin films on Silicon: AlD 6.5 Thin Films on Silicon: Piezofilms 6.6 Thin Films on Silicon: Metal films 7. Thick-Film SOI Wafers: Preparation and Properties Section II: Modeling in MEMS 8. Multiscale Modeling Methods 9. Mechanical Properties of Silicon Microstuctures 10. Electrostatic and RF-properties of MEMS Structures 11. Optical Modeling of MEMS 12. Simulations of Etching Processes for MEMS Fabrication 13. Gas Damping in Vibrating MEMS Structures Section III: Measuring MEMS 14. Introduction to Measuring MEMS 15. Silicon Wafer and Thin Film Measurements 16. Optical Measurement of Static and Dynamic Displacement in MEMS 17. MEMS Residual Stress Characterization: Methodology and Perspective 18. Strength of Bonded Interfaces 19. Oxygen and Bulk Microdefects in Silicon Section IV: Micromachining Technologies in MEMS 20. MEMS Lithography 21. Deep Reactive Ion Etching 22. Wet Etching of Silicon 23. Porous Silicon Based MEMS 24. Surface Micromachining 25. Vapour Phase Etch Processes for Silicon MEMS 26. 2 3-D Printing for MEMS 27. Microfluidics and Biomems in Silicon Section V: Encapsulation of MEMS Components 28. Introduction to encapsulation of MEMS 29. Silicon Direct Bonding 30. Anodic Bonding 31. Glass Frit Bonding 32. Metallic Alloy Seal Bonding 33. Bonding of CMOS Processed Wafers 34. Wafer Bonding: Tools and Processes 35. Encapsulation by Film Deposition 36. Dicing of MEMS Devices 37. 3D Integration of MEMS 38. Via Technologies for MEMS 39. Outgassing and Gettering 40. Hermeticity Tests 41. MEMS Reliability 42. Appendix 1: Common Abbreviations and Acronyms 43. Appendix 2: Nanoindentation Characterization of Silicon and other MEMS Materials
Subject Areas: Electronics engineering [TJF], Materials science [TGM], Nanotechnology [TBN], Engineering: general [TBC]
