Handbook of Crystal Growth
Thin Films and Epitaxy

This newly revised and updated handbook provides a comprehensive compendium on crystal growth, focussed particularly on techniques, thin films, and epitaxy

Tom Kuech (Edited by)

9780444633040, Elsevier Science

Multiple-component retail product, published 14 November 2014

1382 pages
23.4 x 19 x 6.1 cm, 3.46 kg

"...any library in the materials science or chemical engineering departments of universities should carry these volumes.... I would recommend it to academics in the crystal growth field who want to have a complete reference work they can use to ensure their students are well grounded in the fundamentals and also to industrial crystal-growers who now and then need to understand why it is that what they do actually works."
-- Advanced Materials

Volume IIIA Basic Techniques
Handbook of Crystal Growth, Second Edition Volume IIIA (Basic Techniques), edited by chemical and biological engineering expert Thomas F. Kuech, presents the underpinning science and technology associated with epitaxial growth as well as highlighting many of the chief and burgeoning areas for epitaxial growth. Volume IIIA focuses on major growth techniques which are used both in the scientific investigation of crystal growth processes and commercial development of advanced epitaxial structures. Techniques based on vacuum deposition, vapor phase epitaxy, and liquid and solid phase epitaxy are presented along with new techniques for the development of three-dimensional nano-and micro-structures.

Volume IIIB Materials, Processes, and Technology
Handbook of Crystal Growth, Second Edition Volume IIIB (Materials, Processes, and Technology), edited by chemical and biological engineering expert Thomas F. Kuech, describes both specific techniques for epitaxial growth as well as an array of materials-specific growth processes. The volume begins by presenting variations on epitaxial growth process where the kinetic processes are used to develop new types of materials at low temperatures. Optical and physical characterizations of epitaxial films are discussed for both in situ and exit to characterization of epitaxial materials. The remainder of the volume presents both the epitaxial growth processes associated with key technology materials as well as unique structures such as monolayer and two dimensional materials.

Volume 3A

1: Epitaxy for Energy applications
2: Hydride Vapor Phase Epitaxy
3: The principles and practice of organometallic vapor phase epitaxy
4: Principles of molecular beam epitaxy (Si or IIIV)
5: Molecular beam epitaxy with gaseous source
6: Liquid phase epitaxy
7: Solid phase epitaxy
8: Pulsed laser deposition
9: Nanowire growth (VLS or VSS)
10: Selective area masked growth (nano-to-micro)
11: Templated growth and van der walls epitaxy graphoepitaxy
12: Epitaxial small organic molecules
13: Oxide thin films
14: Epitaxy of carbon-based materials: diamond thinfilm
15: Magnetic Semiconductors
16: MOVPE of Nitrides (LEO)
17: MBE of nitrides
18: Graphene
19: Chemical Vapor Deposition of Two-Dimensional Crystals

Volume 3B

1: Kinetic processes in vapour phase epitaxy
2: Organometallic vapor phase epitaxy reaction chemical kinetics
3: Transport phenomena in vapor phase epitaxy reactors
4: Nucleation and surface diffusion in molecular beam epitaxy
5: Film stress and mechanics in thin film epitaxy
6: Low Temperature and Metamorphic buffer layers
7: Self-assembly in Epitaxial growth
8: "Atomic layer or Modulated Epitaxial Growth Techniques"
9: Epitaxial Growth of SiC
10: In situ optical studies of epitaxial growth
11: X-ray and electron diffraction
12: Growth of III-V’s on Silicon:nitrides and arsenides
13: Si and Si-based alloy epitaxy

Subject Areas: Crystallography [PNT]