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Glow Discharge Processes
Sputtering and Plasma Etching

Brian Chapman (Author)

9780471078289, Wiley

Hardback, published 5 November 1980

432 pages
24 x 16.4 x 3.3 cm, 0.848 kg

Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

Gases.

Gas Phase Collision Processes.

Plasmas.

DC Glow Discharges.

RF Discharges.

Sputtering.

Plasma Etching.

Appendices.

Index.

Subject Areas: Electronics & communications engineering [TJ]

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