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Flowing Plasmas and Afterglows with Nitrogen for Surface Modifications
TiO2 Nitriding and N-atoms Sterilization
Andre Ricard (Edited by), Ricard (Author), Jayr Amorim (Edited by), Jayr Amorim (Author)
9781789452440, Wiley
Hardback, published 13 July 2026
272 pages
23.5 x 15.6 x 1.8 cm, 0.517 kg
Flowing Plasmas and Afterglows with Nitrogen for Surface Modifications focuses on N2 microwave flowing plasmas and afterglows in two-photon absorption laser induced fluorescence (TALIF) diagnostics applied to kinetic reactions in flowing afterglows of gas mixtures containing N2 and H2 . It also examines the applications of N2 afterglows in TiO2 surface nitriding and in the sterilization of medical instruments. This book first covers plasma diagnostics, considering electron collisions on neutral atoms and molecules, and applying optical spectroscopy to vibrational and rotational (gas) temperature measurements. It then focuses on microwave plasmas and afterglow reactions with laser detection of active species – such as N and H atoms – applying the results on N-atoms TiO2 surface treatment and sterilization. Lastly, the book delves into afterglows with classifications from low to high gas pressures (up to atmosphere) and from fundamental to applied results. A postface is devoted to several setups of glow discharges and optimal values of atom densities.
Preface xi Part 1. Plasmas 1 Chapter 1. Plasma Electron Collisions and Optical Spectroscopy 3 1.1. Introduction 3 Chapter 2. Electron, Vibrational and Rotational Temperatures of Plasmas 41 2.1. Introduction 41 Chapter 3. Active Species in Plasmas Produced by Microwave Cavities 65 3.1. Introduction 65 Part 2. Afterglows 91 Chapter 4. Diagnostics of N2 Active Species Densities by Emission Spectroscopy in Afterglow Conditions. Line Intensity Ratio and NO Titration Methods 93 4.1. Introduction 93 Chapter 5. Study of Microwave Afterglows in N2 Gas Mixtures by Emission Spectroscopy and LIF 109 5.1. Introduction 109 Chapter 6. Comparison on RF and HF Afterglows in N2 Gas Mixtures 133 6.1. Introduction 134 Part 3. Applications of Afterglows 175 Chapter 7. Nitriding of TiO2 Surface in the RF and HF Afterglows 177 7.1. Surface reactions 177Contents ix Chapter 8. Afterglows of HF Plasmas in N2 for Sterilization: Plasmalyse 195 8.1. Introduction 196 Postface 243 List of Authors 255
André RICARD and Jayr AMORIM
André RICARD
1.2. Plasma electron collisions 4
1.3. Diatomic spectrum nomenclature 9
1.4. Energy levels and potential curves 11
1.5. Optical emission spectroscopy 16
1.6. Optical absorption spectroscopy 19
1.7. Relative atoms density by actinometry 28
1.8. Conclusion 38
1.9. References 39
André RICARD and Michel TOUZEAU
2.2. N2 electron temperature 42
2.3. Nitrogen vibrational temperature 44
2.4. Nitrogen rotational temperature 47
2.5. Interference of Ar(3P2) and N2(E) metastables in N2 rotational temperature measurements 50
2.6. Rotational temperatures of molecular gases, other than N2 54
2.7. Conclusion 61
2.8. References 62
André RICARD
3.2. Discharges sustained by microwave fields including surface waves at low gas pressure (< 1 Torr) 66
3.3. Ionization of N2 by electron collisions in surfatron and surfaguide cavities (0.1–3 Torr) 77
3.4. UHF plasmas at medium N2 gas pressure (0.1–3 Torr) 79
3.5. Surfatron plasmas at atmospheric gas pressure 81
3.6. Microwave torches at atmospheric gas pressures 84
3.7. Conclusion 88
3.8. References 88
André RICARD and Jean-Philippe SARRETTE
4.2. OES and kinetic reactions in nitrogen afterglow conditions 94
4.3. Titration by NOext of N and O atom density 104
4.4. References 108
Jayr AMORIM, Gérard BARAVIAN, Freddy GABORIAU, André RICARD and Jean-Philippe SARRETTE
5.2. The experimental set-up in LSGS (Nancy) 110
5.3. The N and C atoms density in the Plasmas laboratory (Montreal) 113
5.4. The N and H atoms density by TALIF in LPGP (Orsay) 116
5.5. The N and H atom density by TALIF in Laplace (Toulouse) 121
5.6. Kinetics of the N and H atoms density by TALIF and OES at LAPLACE (Toulouse) 125
5.7. Conclusion 130
5.8. References 130
Jayr AMORIM, André RICARD and Jean-Philippe SARRETTE
6.2. RF and HF N2 flowing plasmas and afterglows 135
6.3. N2 HF afterglows in R(N2, He, Ar)–N2–H2 (CH4) gas mixtures 156
6.4. Conclusion 171
6.5. References 173
Yu-Kwon KIM and André RICARD
7.2. Sample preparation, treatments and analysis 182
7.3. The flowing afterglow of RF and microwave discharges for TiO2 surface activation 183
7.4. Conclusion 193
7.5. References 194
Cristina CANAL, Sarah COUSTY, André RICARD and Jean-Philippe SARRETTE
8.2. The sterilization in the plasmas lab of the University of Montreal 196
8.3. The sterilization in Laplace (University of Toulouse) 199
8.4. Afterglows at atmospheric gas pressure for sterilization 230
8.5. Conclusion 239
8.6. References 241
André RICARD
Index 257
Subject Areas: Physics [PH]
