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EUV Lithography
Vivek Bakshi (Author)
9780470471555, Wiley
Hardback, published 16 January 2009
702 pages
25.4 x 17.8 x 4.3 cm, 1.542 kg
EUVL is an area of intense research and this book provides the foundation required for understanding and applying this technology. It offers contributions from the world's leading EUVL researchers, and provides all the critical information needed by practitioners and those wanting to enter the field.
1. EUV Lithography: A Historical Perspective / Hiroo Kinoshita and Obert Wood 2. EUV LLC: An Historical Perspective / Chuck Gwyn and Stefan Wurm 3. EUV Source Technology / Vivek Bakshi 4A. Optics and Multilayer Coatings for EUVL Systems / Regina Soufli, Saša Bajt, Russell M. Hudyma and John S. Taylor 4B. Projection Systems for Extreme Ultraviolet Lithography / Russell M. Hudyma and Regina Soufli 4C. Specification, Fabrication, Testing, and Mounting of EUVL Optical Substrates / John S. Taylor and Regina Soufli 4D. Multilayer Coatings for EUVL / Regina Soufli and Saša Bajt 5. EUV Optical Testing / Kenneth A. Goldberg 6A. Optics Contamination / Saša Bajt 6B. Grazing Angle Collector Contamination / Valentino Rigato 6C. Normal Incidence (Multilayer) Collector Contamination / David N. Ruzic and Shailendra N. Srivastava 7. EUV Mask and Mask Metrology / Han-Ku Cho and Jinho Ahn 8. Photoresists for Extreme Ultraviolet Lithography / Robert L. Brainard 9. High-Resolution EUV Imaging Tools for Resist Exposure and Aerial Image Monitoring / Malcolm Gower 10. Fundamentals of the EUVL Scanner / Kazuya Ota 11. EUVL System Patterning Performance / Patrick Naulleau, John E. Bjorkholm, and Manish Chandhok 12. Lithography Cost of Ownership / Phil Seidel Appendix: Example Case Studies of Lithography CoO Calculations
Subject Areas: Electronics & communications engineering [TJ]
