Developments in Surface Contamination and Cleaning, Volume 3
Methods for Removal of Particle Contaminants

This series provides a state-of-the-art reference for all major areas in surface contamination and cleaning for industries ranging from semiconductor fabrication to space exploration. This book provides information on the latest developments in methods for removal of particle contaminants on surfaces from the well-established methods to the newest methods for removal of smaller particles (<100nm) on newer substrate materials

Rajiv Kohli (Author), Kashmiri L. Mittal (Author)

9781437778854, Elsevier Science

Hardback, published 25 March 2011

258 pages
22.9 x 15.1 x 2.2 cm, 0.46 kg

The contributions in this volume cover methods for removal of particle contaminants on surfaces. Several of these methods are well established and have been employed in industrial applications for a long time. However, the ever- higher demand for removal of smaller particles on newer substrate materials is driving continuous development of the established cleaning methods and alternative innovative methods for particle removal. This book provides information on the latest developments in this topic area.

Aqueous MethodsMegasonic CleaningHydrodynamic Removal of ParticlesBrush CleaningLaser Methods for CleaningCO2 Pellet Cleaning; Cleaning Using Acoustic FieldsPrecision Cleaning Using Cluster BeamsElectrostatic Methods for CleaningWipers for CleaningProjectile Cleaning

Subject Areas: Environmental science, engineering & technology [TQ], Electronic devices & materials [TJFD], Electronics & communications engineering [TJ], Materials science [TGM], Physics [PH]