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Advances in Imaging and Electron Physics

Peter W. Hawkes (Series edited by)

9780123813121, Elsevier Science

Hardback, published 6 December 2010

392 pages
22.9 x 15.1 x 2.6 cm, 0.66 kg

Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy.

This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

  1. Magnetolithography - from the Bottom-Up Route to High Throughput – Amos Bardea and Ron Naaman
  2. The Optics of the Spatial Coherence Wavelets – Román Castañeda
  3. Common Diffraction Integral Calculation Based on Fast Fourier Transform Algorithm – LI Junchang, WU Yanmei and LI Yan
  4. A generalized approach to describe the interference contrast and the phase contrast method – Marcel Teschke and Stefan Sinzinger
  5. Nonlinear partial differential equations for noise problems – Booyong Choi
  6. Harmuth Corrigenda - Henning Harmuth

Subject Areas: Signal processing [UYS], Imaging systems & technology [TTBM], Laser technology & holography [TTBL], Applied optics [TTB], Electronic devices & materials [TJFD], Electronics & communications engineering [TJ], Applied physics [PHV], Electricity, electromagnetism & magnetism [PHK]

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