{"product_id":"surface-analysis-the-principal-techniques-hardback-9780470017630","title":"Surface Analysis; The Principal Techniques (Hardback) 9780470017630","description":"\u003cfont face=\"Georgia\"\u003e\r\n\u003cp\u003e\u003cfont size=\"6\"\u003eSurface Analysis\u003c\/font\u003e\u003cbr\u003e\r\n\u003cfont size=\"5\"\u003eThe Principal Techniques\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\r\n\r\n\r\n\u003cp\u003e\u003cfont size=\"4\"\u003eJohn C. Vickerman (Edited by), JC Vickerman (Author), Ian S. Gilmore (Edited by)\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003e9780470017630, Wiley\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003eHardback, published 27 March 2009\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003e688 pages\u003cbr\u003e25 x 17.8 x 3.8 cm, 1.619 kg\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\r\n\r\n\r\n\r\n\u003cp align=\"justify\"\u003e\u003cstrong\u003e\u003cfont size=\"3\"\u003eDie Theorie und Praxis der Oberflächenanalyse wird von Experten mehrerer Fachgebiete erläutert. Dadurch wird der Leser in die Lage versetzt, Ergebnisse und Datenreihen zu verstehen und umzusetzen.\u003c\/font\u003e\u003c\/strong\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003e\u003cp\u003eList of Contributors xv\u003c\/p\u003e \u003cp\u003ePreface xvii\u003c\/p\u003e \u003cp\u003e\u003cb\u003e1 Introduction 1\u003c\/b\u003e\u003cbr\u003e\u003ci\u003eJohn C. Vickerman\u003c\/i\u003e\u003c\/p\u003e \u003cp\u003e1.1 How do we Define the Surface? 1\u003c\/p\u003e \u003cp\u003e1.2 How Many Atoms in a Surface? 2\u003c\/p\u003e \u003cp\u003e1.3 Information Required 3\u003c\/p\u003e \u003cp\u003e1.4 Surface Sensitivity 5\u003c\/p\u003e \u003cp\u003e1.5 Radiation Effects – Surface Damage 7\u003c\/p\u003e \u003cp\u003e1.6 Complexity of the Data 8\u003c\/p\u003e \u003cp\u003e\u003cb\u003e2 Auger Electron Spectroscopy 9\u003c\/b\u003e\u003cbr\u003e\u003ci\u003eHans Jörg Mathieu\u003c\/i\u003e\u003c\/p\u003e \u003cp\u003e2.1 Introduction 9\u003c\/p\u003e \u003cp\u003e2.2 Principle of the Auger Process 10\u003c\/p\u003e \u003cp\u003e2.2.1 Kinetic Energies of Auger Peaks 11\u003c\/p\u003e \u003cp\u003e2.2.2 Ionization Cross-Section 15\u003c\/p\u003e \u003cp\u003e2.2.3 Comparison of Auger and Photon Emission 16\u003c\/p\u003e \u003cp\u003e2.2.4 Electron Backscattering 17\u003c\/p\u003e \u003cp\u003e2.2.5 Escape Depth 18\u003c\/p\u003e \u003cp\u003e2.2.6 Chemical Shifts 19\u003c\/p\u003e \u003cp\u003e2.3 Instrumentation 21\u003c\/p\u003e \u003cp\u003e2.3.1 Electron Sources 22\u003c\/p\u003e \u003cp\u003e2.3.2 Spectrometers 24\u003c\/p\u003e \u003cp\u003e2.3.3 Modes of Acquisition 24\u003c\/p\u003e \u003cp\u003e2.3.4 Detection Limits 29\u003c\/p\u003e \u003cp\u003e2.3.5 Instrument Calibration 30\u003c\/p\u003e \u003cp\u003e2.4 Quantitative Analysis 31\u003c\/p\u003e \u003cp\u003e2.5 Depth Profile Analysis 33\u003c\/p\u003e \u003cp\u003e2.5.1 Thin Film Calibration Standard 34\u003c\/p\u003e \u003cp\u003e2.5.2 Depth Resolution 36\u003c\/p\u003e \u003cp\u003e2.5.3 Sputter Rates 37\u003c\/p\u003e \u003cp\u003e2.5.4 Preferential Sputtering 40\u003c\/p\u003e \u003cp\u003e2.5.5 λ-Correction 41\u003c\/p\u003e \u003cp\u003e2.5.6 Chemical Shifts in AES Profiles 42\u003c\/p\u003e \u003cp\u003e2.6 Summary 43\u003c\/p\u003e \u003cp\u003eReferences 44\u003c\/p\u003e \u003cp\u003eProblems 45\u003c\/p\u003e \u003cp\u003e\u003cb\u003e3 Electron Spectroscopy for Chemical Analysis 47\u003c\/b\u003e\u003cbr\u003e\u003ci\u003eBuddy D. Ratner and David G. Castner\u003c\/i\u003e\u003c\/p\u003e \u003cp\u003e3.1 Overview 47\u003c\/p\u003e \u003cp\u003e3.1.1 The Basic ESCA Experiment 48\u003c\/p\u003e \u003cp\u003e3.1.2 A History of the Photoelectric Effect and ESCA 48\u003c\/p\u003e \u003cp\u003e3.1.3 Information Provided by ESCA 49\u003c\/p\u003e \u003cp\u003e3.2 X-ray Interaction withMatter, the Photoelectron Effect and Photoemission from Solids 50\u003c\/p\u003e \u003cp\u003e3.3 Binding Energy and the Chemical Shift 52\u003c\/p\u003e \u003cp\u003e3.3.1 Koopmans’ Theorem 53\u003c\/p\u003e \u003cp\u003e3.3.2 Initial State Effects 53\u003c\/p\u003e \u003cp\u003e3.3.3 Final State Effects 57\u003c\/p\u003e \u003cp\u003e3.3.4 Binding Energy Referencing 58\u003c\/p\u003e \u003cp\u003e3.3.5 Charge Compensation in Insulators 60\u003c\/p\u003e \u003cp\u003e3.3.6 Peak Widths 61\u003c\/p\u003e \u003cp\u003e3.3.7 Peak Fitting 62\u003c\/p\u003e \u003cp\u003e3.4 Inelastic Mean Free Path and Sampling Depth 63\u003c\/p\u003e \u003cp\u003e3.5 Quantification 67\u003c\/p\u003e \u003cp\u003e3.5.1 Quantification Methods 68\u003c\/p\u003e \u003cp\u003e3.5.2 Quantification Standards 70\u003c\/p\u003e \u003cp\u003e3.5.3 Quantification Example 71\u003c\/p\u003e \u003cp\u003e3.6 Spectral Features 73\u003c\/p\u003e \u003cp\u003e3.7 Instrumentation 80\u003c\/p\u003e \u003cp\u003e3.7.1 Vacuum Systems for ESCA Experiments 80\u003c\/p\u003e \u003cp\u003e3.7.2 X-ray Sources 82\u003c\/p\u003e \u003cp\u003e3.7.3 Analyzers 84\u003c\/p\u003e \u003cp\u003e3.7.4 Data Systems 86\u003c\/p\u003e \u003cp\u003e3.7.5 Accessories 88\u003c\/p\u003e \u003cp\u003e3.8 Spectral Quality 88\u003c\/p\u003e \u003cp\u003e3.9 Depth Profiling 89\u003c\/p\u003e \u003cp\u003e3.10 X–Y Mapping and Imaging 94\u003c\/p\u003e \u003cp\u003e3.11 Chemical Derivatization 96\u003c\/p\u003e \u003cp\u003e3.12 Valence Band 96\u003c\/p\u003e \u003cp\u003e3.13 Perspectives 99\u003c\/p\u003e \u003cp\u003e3.14 Conclusions 100\u003c\/p\u003e \u003cp\u003eAcknowledgements 101\u003c\/p\u003e \u003cp\u003eReferences 101\u003c\/p\u003e \u003cp\u003eProblems 109\u003c\/p\u003e \u003cp\u003e\u003cb\u003e4 Molecular Surface Mass Spectrometry by SIMS 113\u003c\/b\u003e\u003cbr\u003e\u003ci\u003eJohn C. Vickerman\u003c\/i\u003e\u003c\/p\u003e \u003cp\u003e4.1 Introduction 113\u003c\/p\u003e \u003cp\u003e4.2 Basic Concepts 116\u003c\/p\u003e \u003cp\u003e4.2.1 The Basic Equation 116\u003c\/p\u003e \u003cp\u003e4.2.2 Sputtering 116\u003c\/p\u003e \u003cp\u003e4.2.3 Ionization 121\u003c\/p\u003e \u003cp\u003e4.2.4 The Static Limit and Depth Profiling 123\u003c\/p\u003e \u003cp\u003e4.2.5 Surface Charging 124\u003c\/p\u003e \u003cp\u003e4.3 Experimental Requirements 125\u003c\/p\u003e \u003cp\u003e4.3.1 Primary Beam 125\u003c\/p\u003e \u003cp\u003e4.3.2 Mass Analysers 131\u003c\/p\u003e \u003cp\u003e4.4 Secondary Ion Formation 140\u003c\/p\u003e \u003cp\u003e4.4.1 Introduction 140\u003c\/p\u003e \u003cp\u003e4.4.2 Models of Sputtering 143\u003c\/p\u003e \u003cp\u003e4.4.3 Ionization 149\u003c\/p\u003e \u003cp\u003e4.4.4 Influence of the Matrix Effect in Organic Materials Analysis 151\u003c\/p\u003e \u003cp\u003e4.5 Modes of Analysis 155\u003c\/p\u003e \u003cp\u003e4.5.1 Spectral Analysis 155\u003c\/p\u003e \u003cp\u003e4.5.2 SIMS Imaging or Scanning SIMS 166\u003c\/p\u003e \u003cp\u003e4.5.3 Depth Profiling and 3D Imaging 173\u003c\/p\u003e \u003cp\u003e4.6 Ionization of the Sputtered Neutrals 183\u003c\/p\u003e \u003cp\u003e4.6.1 Photon Induced Post-Ionization 184\u003c\/p\u003e \u003cp\u003e4.6.2 Photon Post-Ionization and SIMS 190\u003c\/p\u003e \u003cp\u003e4.7 Ambient Methods of Desorption Mass Spectrometry 194\u003c\/p\u003e \u003cp\u003eReferences 199\u003c\/p\u003e \u003cp\u003eProblems 203\u003c\/p\u003e \u003cp\u003e\u003cb\u003e5 Dynamic SIMS 207\u003c\/b\u003e\u003cbr\u003e\u003ci\u003eDavid McPhail and Mark Dowsett\u003c\/i\u003e\u003c\/p\u003e \u003cp\u003e5.1 Fundamentals and Attributes 207\u003c\/p\u003e \u003cp\u003e5.1.1 Introduction 207\u003c\/p\u003e \u003cp\u003e5.1.2 Variations on a Theme 211\u003c\/p\u003e \u003cp\u003e5.1.3 The Interaction of the Primary Beam with the Sample 214\u003c\/p\u003e \u003cp\u003e5.1.4 Depth Profiling 217\u003c\/p\u003e \u003cp\u003e5.1.5 Complimentary Techniques and Data Comparison 224\u003c\/p\u003e \u003cp\u003e5.2 Areas and Methods of Application 226\u003c\/p\u003e \u003cp\u003e5.2.1 Dopant and Impurity Profiling 226\u003c\/p\u003e \u003cp\u003e5.2.2 Profiling High Concentration Species 227\u003c\/p\u003e \u003cp\u003e5.2.3 Use of SIMS in Near Surface Regions 230\u003c\/p\u003e \u003cp\u003e5.2.4 Applications of SIMS Depth Profiling in Materials Science 233\u003c\/p\u003e \u003cp\u003e5.3 Quantification of Data 233\u003c\/p\u003e \u003cp\u003e5.3.1 Quantification of Depth Profiles 233\u003c\/p\u003e \u003cp\u003e5.3.2 Fabrication of Standards 239\u003c\/p\u003e \u003cp\u003e5.3.3 Depth Measurement and Calibration of the Depth Scale 241\u003c\/p\u003e \u003cp\u003e5.3.4 Sources of Error in Depth Profiles 242\u003c\/p\u003e \u003cp\u003e5.4 Novel Approaches 246\u003c\/p\u003e \u003cp\u003e5.4.1 Bevelling and Imaging or Line Scanning 246\u003c\/p\u003e \u003cp\u003e5.4.2 Reverse-Side Depth Profiling 250\u003c\/p\u003e \u003cp\u003e5.4.3 Two-Dimensional Analysis 251\u003c\/p\u003e \u003cp\u003e5.5 Instrumentation 252\u003c\/p\u003e \u003cp\u003e5.5.1 Overview 252\u003c\/p\u003e \u003cp\u003e5.5.2 Secondary Ion Optics 253\u003c\/p\u003e \u003cp\u003e5.5.3 Dual Beam Methods and ToF 254\u003c\/p\u003e \u003cp\u003e5.5.4 Gating 254\u003c\/p\u003e \u003cp\u003e5.6 Conclusions 256\u003c\/p\u003e \u003cp\u003eReferences 257\u003c\/p\u003e \u003cp\u003eProblems 267\u003c\/p\u003e \u003cp\u003e\u003cb\u003e6 Low-Energy Ion Scattering and Rutherford Backscattering 269\u003c\/b\u003e\u003cbr\u003e\u003ci\u003eEdmund Taglauer\u003c\/i\u003e\u003c\/p\u003e \u003cp\u003e6.1 Introduction 269\u003c\/p\u003e \u003cp\u003e6.2 Physical Basis 271\u003c\/p\u003e \u003cp\u003e6.2.1 The Scattering Process 271\u003c\/p\u003e \u003cp\u003e6.2.2 Collision Kinematics 272\u003c\/p\u003e \u003cp\u003e6.2.3 Interaction Potentials and Cross-sections 275\u003c\/p\u003e \u003cp\u003e6.2.4 Shadow Cone 278\u003c\/p\u003e \u003cp\u003e6.2.5 Computer Simulation 281\u003c\/p\u003e \u003cp\u003e6.3 Rutherford Backscattering 284\u003c\/p\u003e \u003cp\u003e6.3.1 Energy Loss 284\u003c\/p\u003e \u003cp\u003e6.3.2 Apparatus 287\u003c\/p\u003e \u003cp\u003e6.3.3 Beam Effects 289\u003c\/p\u003e \u003cp\u003e6.3.4 Quantitative Layer Analysis 290\u003c\/p\u003e \u003cp\u003e6.3.5 Structure Analysis 293\u003c\/p\u003e \u003cp\u003e6.3.6 Medium-Energy Ion Scattering (MEIS) 297\u003c\/p\u003e \u003cp\u003e6.3.7 The Value of RBS and Comparison to Related Techniques 298\u003c\/p\u003e \u003cp\u003e6.4 Low-Energy Ion Scattering 300\u003c\/p\u003e \u003cp\u003e6.4.1 Neutralization 300\u003c\/p\u003e \u003cp\u003e6.4.2 Apparatus 303\u003c\/p\u003e \u003cp\u003e6.4.3 Surface Composition Analysis 307\u003c\/p\u003e \u003cp\u003e6.4.4 Structure Analysis 316\u003c\/p\u003e \u003cp\u003e6.4.5 Conclusions 323\u003c\/p\u003e \u003cp\u003eAcknowledgement 324\u003c\/p\u003e \u003cp\u003eReferences 324\u003c\/p\u003e \u003cp\u003eProblems 330\u003c\/p\u003e \u003cp\u003eKey Facts 330\u003c\/p\u003e \u003cp\u003e\u003cb\u003e7 Vibrational Spectroscopy from Surfaces 333\u003c\/b\u003e\u003cbr\u003e\u003ci\u003eMartyn E. Pemble and Peter Gardner\u003c\/i\u003e\u003c\/p\u003e \u003cp\u003e7.1 Introduction 333\u003c\/p\u003e \u003cp\u003e7.2 Infrared Spectroscopy from Surfaces 334\u003c\/p\u003e \u003cp\u003e7.2.1 Transmission IR Spectroscopy 335\u003c\/p\u003e \u003cp\u003e7.2.2 Photoacoustic Spectroscopy 340\u003c\/p\u003e \u003cp\u003e7.2.3 Reflectance Methods 342\u003c\/p\u003e \u003cp\u003e7.3 Electron Energy Loss Spectroscopy (EELS) 361\u003c\/p\u003e \u003cp\u003e7.3.1 Inelastic or ‘Impact’ Scattering 362\u003c\/p\u003e \u003cp\u003e7.3.2 Elastic or ‘Dipole’ Scattering 365\u003c\/p\u003e \u003cp\u003e7.3.3 The EELS (HREELS) Experiment 367\u003c\/p\u003e \u003cp\u003e7.4 The Group Theory of Surface Vibrations 368\u003c\/p\u003e \u003cp\u003e7.4.1 General Approach 368\u003c\/p\u003e \u003cp\u003e7.4.2 Group Theory Analysis of Ethyne Adsorbed at a Flat, Featureless Surface 369\u003c\/p\u003e \u003cp\u003e7.4.3 Group Theory Analysis of Ethyne Adsorbed at a (100) Surface of an FCC Metal 373\u003c\/p\u003e \u003cp\u003e7.4.4 The Expected Form of the RAIRS and Dipolar EELS (HREELS) Spectra 374\u003c\/p\u003e \u003cp\u003e7.5 Laser Raman Spectroscopy from Surfaces 375\u003c\/p\u003e \u003cp\u003e7.5.1 Theory of Raman Scattering 376\u003c\/p\u003e \u003cp\u003e7.5.2 The Study of Collective Surface Vibrations (Phonons) using Raman Spectroscopy 377\u003c\/p\u003e \u003cp\u003e7.5.3 Raman Spectroscopy from Metal Surfaces 379\u003c\/p\u003e \u003cp\u003e7.5.4 Spatial Resolution in Surface Raman Spectroscopy 380\u003c\/p\u003e \u003cp\u003e7.5.5 Fourier Transform Surface Raman Techniques 380\u003c\/p\u003e \u003cp\u003e7.6 Inelastic Neutron Scattering (INS) 381\u003c\/p\u003e \u003cp\u003e7.6.1 Introduction to INS 381\u003c\/p\u003e \u003cp\u003e7.6.2 The INS Spectrum 382\u003c\/p\u003e \u003cp\u003e7.6.3 INS Spectra ofHydrodesesulfurization Catalysts 382\u003c\/p\u003e \u003cp\u003e7.7 Sum-Frequency Generation Methods 383\u003c\/p\u003e \u003cp\u003eReferences 386\u003c\/p\u003e \u003cp\u003eProblems 389\u003c\/p\u003e \u003cp\u003e\u003cb\u003e8 Surface Structure Determination by Interference Techniques 391\u003c\/b\u003e\u003cbr\u003e\u003ci\u003eChristopher A. Lucas\u003c\/i\u003e\u003c\/p\u003e \u003cp\u003e8.1 Introduction 391\u003c\/p\u003e \u003cp\u003e8.1.1 Basic Theory of Diffraction – Three Dimensions 392\u003c\/p\u003e \u003cp\u003e8.1.2 Extension to Surfaces – Two Dimensions 398\u003c\/p\u003e \u003cp\u003e8.2 Electron Diffraction Techniques 402\u003c\/p\u003e \u003cp\u003e8.2.1 General Introduction 402\u003c\/p\u003e \u003cp\u003e8.2.2 Low Energy Electron Diffraction 403\u003c\/p\u003e \u003cp\u003e8.2.3 Reflection High Energy Electron Diffraction (RHEED) 418\u003c\/p\u003e \u003cp\u003e8.3 X-ray Techniques 424\u003c\/p\u003e \u003cp\u003e8.3.1 General Introduction 424\u003c\/p\u003e \u003cp\u003e8.3.2 X-ray Adsorption Spectroscopy 427\u003c\/p\u003e \u003cp\u003e8.3.3 Surface X-ray Diffraction (SXRD) 447\u003c\/p\u003e \u003cp\u003e8.3.4 X-ray Standing Waves (XSWs) 456\u003c\/p\u003e \u003cp\u003e8.4 Photoelectron Diffraction 464\u003c\/p\u003e \u003cp\u003e8.4.1 Introduction 464\u003c\/p\u003e \u003cp\u003e8.4.2 Theoretical Considerations 465\u003c\/p\u003e \u003cp\u003e8.4.3 Experimental Details 469\u003c\/p\u003e \u003cp\u003e8.4.4 Applications of XPD and PhD 470\u003c\/p\u003e \u003cp\u003eReferences 474\u003c\/p\u003e \u003cp\u003e\u003cb\u003e9 Scanning Probe Microscopy 479\u003c\/b\u003e\u003cbr\u003e\u003ci\u003eGraham J. Leggett\u003c\/i\u003e\u003c\/p\u003e \u003cp\u003e9.1 Introduction 479\u003c\/p\u003e \u003cp\u003e9.2 Scanning Tunnelling Microscopy 480\u003c\/p\u003e \u003cp\u003e9.2.1 Basic Principles of the STM 481\u003c\/p\u003e \u003cp\u003e9.2.2 Instrumentation and Basic Operation Parameters 487\u003c\/p\u003e \u003cp\u003e9.2.3 Atomic Resolution and Spectroscopy: Surface Crystal and Electronic Structure 489\u003c\/p\u003e \u003cp\u003e9.3 Atomic Force Microscopy 511\u003c\/p\u003e \u003cp\u003e9.3.1 Basic Principles of the AFM 511\u003c\/p\u003e \u003cp\u003e9.3.2 Chemical Force Microscopy 524\u003c\/p\u003e \u003cp\u003e9.3.3 Friction Force Microscopy 526\u003c\/p\u003e \u003cp\u003e9.3.4 Biological Applications of the AFM 532\u003c\/p\u003e \u003cp\u003e9.4 Scanning Near-Field Optical Microscopy 537\u003c\/p\u003e \u003cp\u003e9.4.1 Optical Fibre Near-Field Microscopy 537\u003c\/p\u003e \u003cp\u003e9.4.2 Apertureless SNOM 541\u003c\/p\u003e \u003cp\u003e9.5 Other Scanning Probe Microscopy Techniques 542\u003c\/p\u003e \u003cp\u003e9.6 Lithography Using Probe Microscopy Methods 544\u003c\/p\u003e \u003cp\u003e9.6.1 STM Lithography 544\u003c\/p\u003e \u003cp\u003e9.6.2 AFM Lithography 545\u003c\/p\u003e \u003cp\u003e9.6.3 Near-Field Photolithography 549\u003c\/p\u003e \u003cp\u003e9.6.4 The ‘Millipede’ 550\u003c\/p\u003e \u003cp\u003e9.7 Conclusions 551\u003c\/p\u003e \u003cp\u003eReferences 552\u003c\/p\u003e \u003cp\u003eProblems 559\u003c\/p\u003e \u003cp\u003e\u003cb\u003e10 The Application of Multivariate Data Analysis Techniques in Surface Analysis 563\u003c\/b\u003e\u003cbr\u003e\u003ci\u003eJoanna L.S. Lee and Ian S. Gilmore\u003c\/i\u003e\u003c\/p\u003e \u003cp\u003e10.1 Introduction 563\u003c\/p\u003e \u003cp\u003e10.2 Basic Concepts 565\u003c\/p\u003e \u003cp\u003e10.2.1 Matrix and Vector Representation of Data 565\u003c\/p\u003e \u003cp\u003e10.2.2 Dimensionality and Rank 567\u003c\/p\u003e \u003cp\u003e10.2.3 Relation to Multivariate Analysis 568\u003c\/p\u003e \u003cp\u003e10.2.4 Choosing the Appropriate Multivariate Method 568\u003c\/p\u003e \u003cp\u003e10.3 Factor Analysis for Identification 569\u003c\/p\u003e \u003cp\u003e10.3.1 Terminology 570\u003c\/p\u003e \u003cp\u003e10.3.2 Mathematical Background 570\u003c\/p\u003e \u003cp\u003e10.3.3 Principal Component Analysis 571\u003c\/p\u003e \u003cp\u003e10.3.4 Multivariate Curve Resolution 579\u003c\/p\u003e \u003cp\u003e10.3.5 Analysis of Multivariate Images 582\u003c\/p\u003e \u003cp\u003e10.4 Regression Methods for Quantification 591\u003c\/p\u003e \u003cp\u003e10.4.1 Terminology 591\u003c\/p\u003e \u003cp\u003e10.4.2 Mathematical Background 592\u003c\/p\u003e \u003cp\u003e10.4.3 Principal Component Regression 594\u003c\/p\u003e \u003cp\u003e10.4.4 Partial Least Squares Regression 595\u003c\/p\u003e \u003cp\u003e10.4.5 Calibration, Validation and Prediction 596\u003c\/p\u003e \u003cp\u003e10.4.6 Example – Correlating ToF–SIMS Spectra with PolymerWettability Using PLS 598\u003c\/p\u003e \u003cp\u003e10.5 Methods for Classification 600\u003c\/p\u003e \u003cp\u003e10.5.1 Discriminant Function Analysis 601\u003c\/p\u003e \u003cp\u003e10.5.2 Hierarchal Cluster Analysis 602\u003c\/p\u003e \u003cp\u003e10.5.3 Artificial Neural Networks 603\u003c\/p\u003e \u003cp\u003e10.6 Summary and Conclusion 606\u003c\/p\u003e \u003cp\u003eAcknowledgements 608\u003c\/p\u003e \u003cp\u003eReferences 608\u003c\/p\u003e \u003cp\u003eProblems 611\u003c\/p\u003e \u003cp\u003e\u003cb\u003eAppendix 1 Vacuum Technology for Applied Surface Science 613\u003c\/b\u003e\u003cbr\u003e\u003ci\u003eRod Wilson\u003c\/i\u003e\u003c\/p\u003e \u003cp\u003eA1.1 Introduction: Gases and Vapours 613\u003c\/p\u003e \u003cp\u003eA1.2 The Pressure Regions of Vacuum Technology and their Characteristics 619\u003c\/p\u003e \u003cp\u003eA1.3 Production of a Vacuum 622\u003c\/p\u003e \u003cp\u003eA1.3.1 Types of Pump 622\u003c\/p\u003e \u003cp\u003eA1.3.2 Evacuation of a Chamber 634\u003c\/p\u003e \u003cp\u003eA1.3.3 Choice of Pumping System 635\u003c\/p\u003e \u003cp\u003eA1.3.4 Determination of the Size of Backing Pumps 636\u003c\/p\u003e \u003cp\u003eA1.3.5 Flanges and their Seals 636\u003c\/p\u003e \u003cp\u003eA1.4 Measurement of Low Pressures 637\u003c\/p\u003e \u003cp\u003eA1.4.1 Gauges for Direct Pressure Measurement 638\u003c\/p\u003e \u003cp\u003eA1.4.2 Gauges Using Indirect Means of Pressure Measurement 640\u003c\/p\u003e \u003cp\u003eA1.4.3 Partial Pressure Measuring Instruments 644\u003c\/p\u003e \u003cp\u003eAcknowledgement 647\u003c\/p\u003e \u003cp\u003eReferences 647\u003c\/p\u003e \u003cp\u003e\u003cb\u003eAppendix 2 Units, Fundamental Physical Constants and Conversions 649\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003eA2.1 Base Units of the SI 649\u003c\/p\u003e \u003cp\u003eA2.2 Fundamental Physical Constants 650\u003c\/p\u003e \u003cp\u003eA2.3 Other Units and Conversions to SI 651\u003c\/p\u003e \u003cp\u003eReferences 652\u003c\/p\u003e \u003cp\u003eIndex 653\u003c\/p\u003e\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003eSubject Areas: Mechanical engineering \u0026amp; materials [\u003ca title=\"See our other books on Mechanical engineering \u0026amp; materials\" href=\"https:\/\/freshlyprintedbooks.co.uk\/search?q=%22Mechanical%20engineering%20\u0026amp;%20materials%20%5BTG%5D%22\"\u003eTG\u003c\/a\u003e]\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\r\n\u003c\/font\u003e","brand":"Wiley","offers":[{"title":"Brand New","offer_id":52255788990744,"sku":"9780470017630","price":145.97,"currency_code":"GBP","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0730\/2037\/5320\/files\/9780470017630.jpg?v=1781274143","url":"https:\/\/freshlyprintedbooks.co.uk\/products\/surface-analysis-the-principal-techniques-hardback-9780470017630","provider":"Freshly Printed Books","version":"1.0","type":"link"}