{"product_id":"sub-half-micron-lithography-for-ulsis-paperback-9780521022347","title":"Sub-Half-Micron Lithography for ULSIs (Paperback \/ softback) 9780521022347","description":"\u003cfont face=\"Georgia\"\u003e\r\n\u003cp\u003e\u003cfont size=\"6\"\u003eSub-Half-Micron Lithography for ULSIs\u003c\/font\u003e\u003cbr\u003e\r\n\r\n\r\n\u003c\/p\u003e\n\u003cp\u003e\u003cem\u003eDescribes advanced techniques under development that represent the key to future semiconductor-device fabrication.\u003c\/em\u003e\u003c\/p\u003e\r\n\r\n\r\n\u003cp\u003e\u003cfont size=\"4\"\u003eKatsumi Suzuki (Edited by), Shinji Matsui (Edited by), Yukinori Ochiai (Edited by)\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003e9780521022347, Cambridge University Press\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003ePaperback \/ softback, published 10 November 2005\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003e344 pages, 103 b\/w illus.  43 tables\u003cbr\u003e24.5 x 17.9 x 1.8 cm, 0.616 kg\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\r\n\r\n\r\n\r\n\u003cp align=\"justify\"\u003e\u003cstrong\u003e\u003cfont size=\"3\"\u003eIn semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue a breakthrough in lithography technology is now needed. This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. The background to developments in lithography technology, trends in ULSI technology and future prospects are reviewed, and the requirements that future lithography technology must meet are described. Several important lithography methods, such as deep UV lithography, X-ray lithography, electron-beam lithography, and focused ion-beam lithography are described in detail by experts in each area. The principles underlying each of these methods are illustrated at the beginning of each chapter to help the reader understand the basis of the different approaches.\u003c\/font\u003e\u003c\/strong\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003e1. Introduction Masao Fukuma\u003cbr\u003e 2. Optical lithography Kunihiko Kasama, Shinji Okazaki, Hisatake Sano and Wataru Wakamiya\u003cbr\u003e 3. X-ray lithography Kimiyoshi Deguchi, Teruo Hosokawa, Sunao Ishihara and Katsumi Suzuki\u003cbr\u003e 4. Electron beam lithography Takayuki Abe, Koichi Moriizumi, Yukinori Ochiai, Norio Saitou, Tadahiro Takigawa and Akio Yamada\u003cbr\u003e 5. Ion beam lithography Masanori Komuro and Shinj Matsui\u003cbr\u003e 6. Resists Hiroshi Ban, Tadayoshi Kokubo, Makoto Nakase and Takeshi Ohfuji\u003cbr\u003e 7. Metrology, defect inspection and repair Tadahito Matsuda, Toru Tojo and Seiichi Yabumoto\u003cbr\u003e Index.\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003eSubject Areas: Nanotechnology [\u003ca title=\"See our other books on Nanotechnology\" href=\"https:\/\/freshlyprintedbooks.co.uk\/search?q=%22Nanotechnology%20%5BTBN%5D%22\"\u003eTBN\u003c\/a\u003e]\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\r\n\u003c\/font\u003e","brand":"Cambridge University Press","offers":[{"title":"Default Title","offer_id":46005677031704,"sku":"9780521022347","price":35.89,"currency_code":"GBP","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0730\/2037\/5320\/products\/9780521022347i.jpg?v=1694963570","url":"https:\/\/freshlyprintedbooks.co.uk\/products\/sub-half-micron-lithography-for-ulsis-paperback-9780521022347","provider":"Freshly Printed Books","version":"1.0","type":"link"}