{"product_id":"physical-deposition-methods-for-films-and-coatings-hardback-9781119713067","title":"Physical Deposition Methods for Films and Coatings (Hardback) 9781119713067","description":"\u003cfont face=\"Georgia\"\u003e\r\n\u003cp\u003e\u003cfont size=\"6\"\u003ePhysical Deposition Methods for Films and Coatings\u003c\/font\u003e\u003cbr\u003e\r\n\r\n\r\n\r\n\r\n\r\n\u003c\/p\u003e\n\u003cp\u003e\u003cfont size=\"4\"\u003eLech Pawlowski (Author)\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003e9781119713067, Wiley\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003eHardback, published 21 February 2025\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003e432 pages\u003cbr\u003e24.4 x 17 x 3 cm, 0.964 kg\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\r\n\r\n\r\n\r\n\u003cp align=\"justify\"\u003e\u003cstrong\u003e\u003cfont size=\"3\"\u003e\u003cp\u003e\u003cb\u003eComprehensive resource on the subject of deposition techniques for films and coatings and their characterization\u003c\/b\u003e \u003c\/p\u003e\n\u003cp\u003e\u003ci\u003ePhysical Deposition Methods for Films and Coatings\u003c\/i\u003e presents a pedagogical compilation of current knowledge of dry deposition. \u003c\/p\u003e\n\u003cp\u003eWritten by a renowned and awarded academic with more than 40 years of experience in the field, \u003ci\u003ePhysical Deposition Methods for Films and Coatings\u003c\/i\u003e covers topics including: \u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eThe process of making a deposit that appears on the surface, growth of deposits, their post treatments, and characterization methods\u003c\/li\u003e\n\u003cli\u003eDifferent physical and chemical deposition techniques including atomistic, chemical vapor, and various thermal spraying methods\u003c\/li\u003e\n\u003cli\u003eProperties of deposits depending on the material and deposition technique\u003c\/li\u003e\n\u003cli\u003eSubstrate preparation, coating microstructure, and morphology and stability of thin films\u003c\/li\u003e\n\u003cli\u003eExamples of applications of thin films in optical devices, environmental applications, telecommunications devices, and energy storage devices\u003c\/li\u003e\n\u003c\/ul\u003e \u003cp\u003e\u003ci\u003ePhysical Deposition Methods for Films and Coatings\u003c\/i\u003e is an essential reference on the subject for professionals and researchers in surface treatment and graduate students in related programs of study.\u003c\/p\u003e\u003c\/font\u003e\u003c\/strong\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003e\u003cp\u003ePreface xiii\u003c\/p\u003e \u003cp\u003eAbbreviations and Symbols xv\u003c\/p\u003e \u003cp\u003eIntroduction xxv\u003c\/p\u003e \u003cp\u003e\u003cb\u003e1 Substrate Preparation 1\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e1.1 Introduction 1\u003c\/p\u003e \u003cp\u003e1.2 Surfaces of Different Types of Substrates (Metals and Alloys, Ceramics, Polymers) 2\u003c\/p\u003e \u003cp\u003e1.2.1 Metals and Alloys 4\u003c\/p\u003e \u003cp\u003e1.2.2 Ceramics and Glasses 8\u003c\/p\u003e \u003cp\u003e1.2.3 Polymers 11\u003c\/p\u003e \u003cp\u003e1.3 Cleaning of Surface 14\u003c\/p\u003e \u003cp\u003e1.3.1 Chemical Cleaning Methods 14\u003c\/p\u003e \u003cp\u003e1.3.2 Physical Cleaning Methods 16\u003c\/p\u003e \u003cp\u003e1.3.2.1 Thermal Cleaning 16\u003c\/p\u003e \u003cp\u003e1.3.2.2 Particles Cleaning 17\u003c\/p\u003e \u003cp\u003e1.3.2.3 Plasma Cleaning 17\u003c\/p\u003e \u003cp\u003e1.3.2.4 Ions and Atoms Bombardment 20\u003c\/p\u003e \u003cp\u003e1.3.2.5 Ultrasonic Cleaning 22\u003c\/p\u003e \u003cp\u003e1.3.2.6 Photons Cleaning 22\u003c\/p\u003e \u003cp\u003e1.3.3 Monitoring of Surface 24\u003c\/p\u003e \u003cp\u003e1.4 Patterning of Films and Coatings 25\u003c\/p\u003e \u003cp\u003e1.4.1 Lithography 27\u003c\/p\u003e \u003cp\u003e1.4.1.1 Illumination 28\u003c\/p\u003e \u003cp\u003e1.4.1.2 Masks 29\u003c\/p\u003e \u003cp\u003e1.4.1.3 Geometry of Lithography 30\u003c\/p\u003e \u003cp\u003e1.4.1.4 Etching and Removal Processes 30\u003c\/p\u003e \u003cp\u003e1.4.2 Direct Patterning 31\u003c\/p\u003e \u003cp\u003e1.4.2.1 Photons Patterning 31\u003c\/p\u003e \u003cp\u003e1.4.2.2 Particles Patterning 32\u003c\/p\u003e \u003cp\u003e1.5 Activation of Substrates Surface 32\u003c\/p\u003e \u003cp\u003e1.5.1 Activation of Substrates at Atomistic Deposition 33\u003c\/p\u003e \u003cp\u003e1.5.1.1 Liquids Activation 34\u003c\/p\u003e \u003cp\u003e1.5.1.2 Photons Activation 34\u003c\/p\u003e \u003cp\u003e1.5.1.3 Particles Activation 34\u003c\/p\u003e \u003cp\u003e1.5.2 Activation of the Substrates Before Granular Deposits 38\u003c\/p\u003e \u003cp\u003e1.5.2.1 Particles Activation 38\u003c\/p\u003e \u003cp\u003e1.5.2.2 Photons Activation 39\u003c\/p\u003e \u003cp\u003e1.5.2.3 Water jet Activation 40\u003c\/p\u003e \u003cp\u003e1.5.2.4 Plasma Activation 40\u003c\/p\u003e \u003cp\u003eReferences 42\u003c\/p\u003e \u003cp\u003e\u003cb\u003e2 Films and Coatings Deposition Techniques 49\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e2.1 Introduction 49\u003c\/p\u003e \u003cp\u003e2.2 Atomistic Deposition Methods 49\u003c\/p\u003e \u003cp\u003e2.2.1 Physical Vapor Deposition (PVD) by Thermal Evaporation 50\u003c\/p\u003e \u003cp\u003e2.2.1.1 History 50\u003c\/p\u003e \u003cp\u003e2.2.1.2 Principle 51\u003c\/p\u003e \u003cp\u003e2.2.1.3 Sources 52\u003c\/p\u003e \u003cp\u003e2.2.1.4 Medium 55\u003c\/p\u003e \u003cp\u003e2.2.2 Physical Vapor Deposition (PVD) by Sputtering 57\u003c\/p\u003e \u003cp\u003e2.2.2.1 History 57\u003c\/p\u003e \u003cp\u003e2.2.2.2 Principle 58\u003c\/p\u003e \u003cp\u003e2.2.2.3 Source 59\u003c\/p\u003e \u003cp\u003e2.2.2.4 Medium 62\u003c\/p\u003e \u003cp\u003e2.2.3 Ion plating and i-beam-assisted Deposition 63\u003c\/p\u003e \u003cp\u003e2.2.3.1 History 63\u003c\/p\u003e \u003cp\u003e2.2.3.2 Principle 63\u003c\/p\u003e \u003cp\u003e2.2.4 Pulsed-Laser Deposition (PLD) 65\u003c\/p\u003e \u003cp\u003e2.2.4.1 History 65\u003c\/p\u003e \u003cp\u003e2.2.4.2 Principle 66\u003c\/p\u003e \u003cp\u003e2.2.4.3 Source 68\u003c\/p\u003e \u003cp\u003e2.2.4.4 Medium 68\u003c\/p\u003e \u003cp\u003e2.2.5 Chemical Vapor Deposition (CVD) 69\u003c\/p\u003e \u003cp\u003e2.2.5.1 History 70\u003c\/p\u003e \u003cp\u003e2.2.5.2 Principle and Techniques 70\u003c\/p\u003e \u003cp\u003e2.2.5.3 Sources in CVD Techniques 71\u003c\/p\u003e \u003cp\u003e2.2.5.4 Thermal CVD 71\u003c\/p\u003e \u003cp\u003e2.2.5.5 Pe Cvd 77\u003c\/p\u003e \u003cp\u003e2.2.5.6 Laser-Assisted Chemical Vapor Deposition (LCVD) 80\u003c\/p\u003e \u003cp\u003e2.2.5.7 Metal–Organic Chemical Vapor Deposition (MO CVD) 83\u003c\/p\u003e \u003cp\u003e2.2.5.8 Atomic Layer Deposition (ALD) 84\u003c\/p\u003e \u003cp\u003e2.3 Granular Methods of Coatings Deposition 85\u003c\/p\u003e \u003cp\u003e2.3.1 Powder Fedstock 85\u003c\/p\u003e \u003cp\u003e2.3.1.1 Methods of Powder Manufacturing 86\u003c\/p\u003e \u003cp\u003e2.3.1.2 Characterization of Powders 90\u003c\/p\u003e \u003cp\u003e2.3.1.3 Delivery and Injection of Powder to Flame and Plasma 90\u003c\/p\u003e \u003cp\u003e2.3.2 Solid Feedstock Deposition Methods 91\u003c\/p\u003e \u003cp\u003e2.3.2.1 Flame Spraying (FS) 92\u003c\/p\u003e \u003cp\u003e2.3.2.2 Arc Spraying (AS) 93\u003c\/p\u003e \u003cp\u003e2.3.2.3 Atmospheric Plasma Spraying (APS) 94\u003c\/p\u003e \u003cp\u003e2.3.2.4 High-Velocity Oxy-Fuel Spraying (HVOF) 98\u003c\/p\u003e \u003cp\u003e2.3.2.5 Detonation Spraying 101\u003c\/p\u003e \u003cp\u003e2.3.2.6 Cold Gas Spraying Method (CGSM) 102\u003c\/p\u003e \u003cp\u003e2.3.2.7 Vacuum Plasma Spraying (VPS) 104\u003c\/p\u003e \u003cp\u003e2.3.2.8 Plasma Spray Physical Vapor Deposition (PS PVD) 105\u003c\/p\u003e \u003cp\u003e2.3.3 Liquid Feedstock Deposition Method 107\u003c\/p\u003e \u003cp\u003e2.3.3.1 Solutions Preparation 108\u003c\/p\u003e \u003cp\u003e2.3.3.2 Suspension Preparation 108\u003c\/p\u003e \u003cp\u003e2.3.3.3 Delivery and Injection of Liquid to Flame or Plasma 110\u003c\/p\u003e \u003cp\u003e2.3.3.4 Spray Pyrolysis (SP) 111\u003c\/p\u003e \u003cp\u003e2.3.3.5 Suspension Plasma Spraying (SPS) 112\u003c\/p\u003e \u003cp\u003e2.3.3.6 Solution Precursor Plasma Spraying (SPPS) 114\u003c\/p\u003e \u003cp\u003e2.4 Bulk Methods of Coatings Deposition 115\u003c\/p\u003e \u003cp\u003e2.4.1 Plasma Transferred Arc (PTA) 116\u003c\/p\u003e \u003cp\u003e2.4.2 Laser Coatings 117\u003c\/p\u003e \u003cp\u003e2.4.2.1 1-Step Laser Deposition (1SLD) 118\u003c\/p\u003e \u003cp\u003e2.4.2.2 2-step Laser Deposition (2SLD) 121\u003c\/p\u003e \u003cp\u003eReferences 125\u003c\/p\u003e \u003cp\u003e\u003cb\u003e3 Nucleation, Growth, and Microstructure of Physical Deposits 137\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e3.1 Introduction 137\u003c\/p\u003e \u003cp\u003e3.2 Atomistic Deposition Methods 138\u003c\/p\u003e \u003cp\u003e3.2.1 Introduction 138\u003c\/p\u003e \u003cp\u003e3.2.2 Phenomena at Contact and Nucleation 138\u003c\/p\u003e \u003cp\u003e3.2.2.1 Growth in Three Dimensions 140\u003c\/p\u003e \u003cp\u003e3.2.2.2 Nucleation and Growth in Two Dimensions 141\u003c\/p\u003e \u003cp\u003e3.2.2.3 Nucleation and Growth in Two Dimensions and in Three Dimensions 142\u003c\/p\u003e \u003cp\u003e3.2.3 Interface Between Film and Substrate 142\u003c\/p\u003e \u003cp\u003e3.2.4 Microstructure of Films Obtained Using Different Deposition Techniques 143\u003c\/p\u003e \u003cp\u003e3.2.5 Residual Stresses and Defects in Films 147\u003c\/p\u003e \u003cp\u003e3.2.6 Post-deposition Treatment 149\u003c\/p\u003e \u003cp\u003e3.3 Granular Deposits 150\u003c\/p\u003e \u003cp\u003e3.3.1 Introduction 150\u003c\/p\u003e \u003cp\u003e3.3.2 Contact Phenomena 151\u003c\/p\u003e \u003cp\u003e3.3.2.1 Deformation of a Particle 151\u003c\/p\u003e \u003cp\u003e3.3.2.2 Solidification and Cooling of a Particle 154\u003c\/p\u003e \u003cp\u003e3.3.2.3 Adhesion Mechanisms 155\u003c\/p\u003e \u003cp\u003e3.3.3 Nucleation and Growth of a Crystal 157\u003c\/p\u003e \u003cp\u003e3.3.3.1 Phase Composition 158\u003c\/p\u003e \u003cp\u003e3.3.3.2 Inhomogeneity of Deposits, Composites 160\u003c\/p\u003e \u003cp\u003e3.3.4 Build-up of a Coating 162\u003c\/p\u003e \u003cp\u003e3.3.4.1 Temperature of a Coating 163\u003c\/p\u003e \u003cp\u003e3.3.4.2 Residual Stresses 165\u003c\/p\u003e \u003cp\u003e3.3.5 Post-deposition Treatment 167\u003c\/p\u003e \u003cp\u003e3.4 Bulk Deposits 168\u003c\/p\u003e \u003cp\u003e3.4.1 Introduction 168\u003c\/p\u003e \u003cp\u003e3.4.2 Phenomena in the Melt-pool 170\u003c\/p\u003e \u003cp\u003e3.4.3 Laser Shock Treatment 172\u003c\/p\u003e \u003cp\u003e3.4.4 Nucleation in the Melt Pool 172\u003c\/p\u003e \u003cp\u003e3.4.5 Inhomogeneities of Deposits and Thermal Stresses 176\u003c\/p\u003e \u003cp\u003e3.4.6 Post-deposit Treatment 176\u003c\/p\u003e \u003cp\u003eReferences 177\u003c\/p\u003e \u003cp\u003e\u003cb\u003e4 Methods of Films and Coatings Characterization 185\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e4.1 Introduction 185\u003c\/p\u003e \u003cp\u003e4.2 Methods of Microstructure Characterization 186\u003c\/p\u003e \u003cp\u003e4.2.1 Chemical Composition Analyses 187\u003c\/p\u003e \u003cp\u003e4.2.1.1 Auger Electron Spectroscopy (AES) 187\u003c\/p\u003e \u003cp\u003e4.2.1.2 Energy-dispersive X-ray Spectroscopy (EDX) 190\u003c\/p\u003e \u003cp\u003e4.2.1.3 Wavelength-dispersive X-ray Spectroscopy (WDX) 191\u003c\/p\u003e \u003cp\u003e4.2.1.4 Electron Energy Loss Spectroscopy (EELS) 192\u003c\/p\u003e \u003cp\u003e4.2.1.5 Electron Microprobe Analysis (EMPA) 193\u003c\/p\u003e \u003cp\u003e4.2.1.6 Raman Spectroscopy (RS) 194\u003c\/p\u003e \u003cp\u003e4.2.1.7 X-ray Photoelectron Spectroscopy (XPS) 195\u003c\/p\u003e \u003cp\u003e4.2.1.8 X-ray Fluorescence Spectroscopy 197\u003c\/p\u003e \u003cp\u003e4.2.2 Crystallographic Analyses 198\u003c\/p\u003e \u003cp\u003e4.2.2.1 X-ray Diffraction (XRD) 198\u003c\/p\u003e \u003cp\u003e4.2.2.2 Selected Area Diffraction (SAD) 199\u003c\/p\u003e \u003cp\u003e4.2.2.3 Electron Backscatter Diffraction (EBSD) 200\u003c\/p\u003e \u003cp\u003e4.2.3 Analyses of Morphology 201\u003c\/p\u003e \u003cp\u003e4.2.3.1 Optical Microscope (OM) 201\u003c\/p\u003e \u003cp\u003e4.2.3.2 Scanning Electron Microscope (SEM) 202\u003c\/p\u003e \u003cp\u003e4.2.3.3 Scanning Tunneling Microscope (STM) 203\u003c\/p\u003e \u003cp\u003e4.2.3.4 Atomic Force Microscope (AFM) 205\u003c\/p\u003e \u003cp\u003e4.2.3.5 Transmission Electron Microscope (TEM) 205\u003c\/p\u003e \u003cp\u003e4.3 Mechanical Properties of Films and Coatings 208\u003c\/p\u003e \u003cp\u003e4.3.1 Fundamentals of Mechanical Properties 208\u003c\/p\u003e \u003cp\u003e4.3.2 Adhesion 210\u003c\/p\u003e \u003cp\u003e4.3.3 Hardness and Microhardness 211\u003c\/p\u003e \u003cp\u003e4.3.4 Elasticity of Deposits 213\u003c\/p\u003e \u003cp\u003e4.3.5 Fracture Toughness 215\u003c\/p\u003e \u003cp\u003e4.3.6 Friction and Wear 216\u003c\/p\u003e \u003cp\u003e4.3.7 Residual Stresses 219\u003c\/p\u003e \u003cp\u003e4.4 Physical Properties of Films and Coatings 220\u003c\/p\u003e \u003cp\u003e4.4.1 Thickness 220\u003c\/p\u003e \u003cp\u003e4.4.2 Porosity 220\u003c\/p\u003e \u003cp\u003e4.4.3 Thermophysical Properties 222\u003c\/p\u003e \u003cp\u003e4.4.3.1 Thermal Conductivity 223\u003c\/p\u003e \u003cp\u003e4.4.3.2 Specific Heat and Thermal Expansion 224\u003c\/p\u003e \u003cp\u003e4.4.3.3 Emissivity 225\u003c\/p\u003e \u003cp\u003e4.4.3.4 Thermal Shock Resistance 225\u003c\/p\u003e \u003cp\u003e4.4.4 Contact Angle 225\u003c\/p\u003e \u003cp\u003e4.5 Corrosion Resistance 226\u003c\/p\u003e \u003cp\u003e4.5.1 Aqueous Corrosion 226\u003c\/p\u003e \u003cp\u003e4.5.2 Hot Corrosion 229\u003c\/p\u003e \u003cp\u003e4.6 Electric and Magnetic Properties of Films and Coatings 229\u003c\/p\u003e \u003cp\u003e4.6.1 Electric Conductivity and Resistivity 230\u003c\/p\u003e \u003cp\u003e4.6.2 Dielectric Properties 232\u003c\/p\u003e \u003cp\u003e4.6.3 Magnetic Properties 234\u003c\/p\u003e \u003cp\u003e4.7 Optical Properties of Films and Coatings 235\u003c\/p\u003e \u003cp\u003e4.8 Characterization of Biomaterials 238\u003c\/p\u003e \u003cp\u003e4.8.1 Introduction 238\u003c\/p\u003e \u003cp\u003e4.8.2 In vitro Characterization 239\u003c\/p\u003e \u003cp\u003e4.8.3 In vivo Characterization 239\u003c\/p\u003e \u003cp\u003eReferences 240\u003c\/p\u003e \u003cp\u003e\u003cb\u003e5 Properties of Films and Coatings 251\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e5.1 Introduction 251\u003c\/p\u003e \u003cp\u003e5.2 Mechanical Properties 252\u003c\/p\u003e \u003cp\u003e5.2.1 Hardness and Microhardness 252\u003c\/p\u003e \u003cp\u003e5.2.1.1 Atomistic Films 252\u003c\/p\u003e \u003cp\u003e5.2.1.2 Granular Coatings 257\u003c\/p\u003e \u003cp\u003e5.2.1.3 Bulk Deposits 263\u003c\/p\u003e \u003cp\u003e5.2.2 Adhesion 265\u003c\/p\u003e \u003cp\u003e5.2.2.1 Atomistic Deposits 269\u003c\/p\u003e \u003cp\u003e5.2.2.2 Granular Deposits 272\u003c\/p\u003e \u003cp\u003e5.2.3 Elasticity, Strength, and Toughness 274\u003c\/p\u003e \u003cp\u003e5.2.3.1 Atomistic Deposits 274\u003c\/p\u003e \u003cp\u003e5.2.3.2 Granular Deposits 275\u003c\/p\u003e \u003cp\u003e5.2.4 Friction and Wear 283\u003c\/p\u003e \u003cp\u003e5.2.4.1 Atomistic Deposits 284\u003c\/p\u003e \u003cp\u003e5.2.4.2 Granular Coatings 287\u003c\/p\u003e \u003cp\u003e5.2.4.3 Bulk Coatings 297\u003c\/p\u003e \u003cp\u003e5.2.5 Example of Coatings Applications: Anilox Rolls 302\u003c\/p\u003e \u003cp\u003e5.3 Electric and Magnetic Properties 304\u003c\/p\u003e \u003cp\u003e5.3.1 Conductors and Resistors 304\u003c\/p\u003e \u003cp\u003e5.3.1.1 Atomistic Deposits 305\u003c\/p\u003e \u003cp\u003e5.3.1.2 Granular Deposits 307\u003c\/p\u003e \u003cp\u003e5.3.2 Dielectric Properties 309\u003c\/p\u003e \u003cp\u003e5.3.2.1 Atomistic Deposits 310\u003c\/p\u003e \u003cp\u003e5.3.2.2 Granular Deposits 310\u003c\/p\u003e \u003cp\u003e5.3.3 Magnetic Properties 313\u003c\/p\u003e \u003cp\u003e5.3.3.1 Atomistic Deposits 313\u003c\/p\u003e \u003cp\u003e5.3.3.2 Granular Deposits 315\u003c\/p\u003e \u003cp\u003e5.3.4 Superconductors 315\u003c\/p\u003e \u003cp\u003e5.3.4.1 Atomistic Deposits 317\u003c\/p\u003e \u003cp\u003e5.3.4.2 Granular Deposits 317\u003c\/p\u003e \u003cp\u003e5.3.5 Electron Emitters 317\u003c\/p\u003e \u003cp\u003e5.3.5.1 Atomistic Films 319\u003c\/p\u003e \u003cp\u003e5.3.5.2 Granular Coatings 319\u003c\/p\u003e \u003cp\u003e5.4 Thermophysical Properties 321\u003c\/p\u003e \u003cp\u003e5.4.1 Thermal Conductivity and Diffusivity 322\u003c\/p\u003e \u003cp\u003e5.4.1.1 Atomistic Deposits 322\u003c\/p\u003e \u003cp\u003e5.4.1.2 Granular Deposits 323\u003c\/p\u003e \u003cp\u003e5.4.2 Emissivity 328\u003c\/p\u003e \u003cp\u003e5.5 Corrosion Resistance 332\u003c\/p\u003e \u003cp\u003e5.5.1 Aqueous Corrosion 332\u003c\/p\u003e \u003cp\u003e5.5.1.1 Atomistic Films 334\u003c\/p\u003e \u003cp\u003e5.5.1.2 Granular Coatings 334\u003c\/p\u003e \u003cp\u003e5.5.1.3 Bulk Deposits 336\u003c\/p\u003e \u003cp\u003e5.5.2 Hot Corrosion 338\u003c\/p\u003e \u003cp\u003e5.5.2.1 Atomistic Deposits 342\u003c\/p\u003e \u003cp\u003e5.5.2.2 Granular Deposits 342\u003c\/p\u003e \u003cp\u003e5.5.2.3 Bulk Deposits 345\u003c\/p\u003e \u003cp\u003e5.6 Optical Properties 345\u003c\/p\u003e \u003cp\u003e5.6.1 Decorative Deposits 345\u003c\/p\u003e \u003cp\u003e5.6.2 Functional Deposits 349\u003c\/p\u003e \u003cp\u003e5.7 Biomaterials 349\u003c\/p\u003e \u003cp\u003e5.7.1 Atomistic Deposits 351\u003c\/p\u003e \u003cp\u003e5.7.2 Granular Deposits 353\u003c\/p\u003e \u003cp\u003eReferences 357\u003c\/p\u003e \u003cp\u003eIndex 381\u003c\/p\u003e\u003c\/font\u003e\u003c\/p\u003e\r\n\r\n\u003cp\u003e\u003cfont size=\"3\"\u003eSubject Areas: Mechanical engineering \u0026amp; materials [\u003ca title=\"See our other books on Mechanical engineering \u0026amp; materials\" 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